in one-stop service
NEWTEK Gas presents a cutting-edge PSA (Pressure Swing Adsorption) Oxygen Generation System specifically engineered for semiconductor manufacturing environments. This modular solution delivers 99.5% ultra-high purity oxygen with flow rates ranging from 5-3000Nm³/h, featuring intelligent integration capabilities for cleanroom operations.


Core Technical Advantages
Dual-column 13X molecular sieve system achieves >99.999% O₂ purity
±0.5% concentration stability through real-time laser gas analysis
0.1μm multi-stage filtration (HEPA+ULPA) ensures ISO Class 3 compliance
- 30% lower power consumption than conventional systems
- Heat recovery system reduces thermal load in fab environments
- <65dB(A) noise level with acoustic enclosure option
Scalable skid-mounted design supports 20%-200% capacity expansion
Air Compression Unit (Oil-free scroll technology)
Purification Tower (Automatic TSA moisture removal)
Smart Control Cabinet (PLC+HMI with SECS/GEM protocol)
Semiconductor Process Applications
✔ Thermal Oxidation
Precision O₂ supply for gate oxide growth (2-200Å thickness control)
✔ Dry Etching
Plasma-stable gas supply for nanoscale patterning
✔ CVD Chamber Purge
Ultra-dry oxygen for particle contamination prevention
✔ Wafer Annealing
High-purity atmosphere control for dopant activation

Smart Monitoring System
Real-time impurity monitoring (ppb-level detection)
Predictive maintenance with AI algorithm (98% accuracy)
Remote diagnostics via IIoT platform (OPC UA/MTConnect)
SEMI F5-0202 Cleanroom Gas Standards
CE/UL/ETL Electrical Safety Certification
ISO 14644-1 Class 3 Cleanroom Compatibility
we provide
▲ Global Technical Network:24/7 multilingual support with <4hr response time
▲ Lifetime Optimization Program:Annual efficiency audit and Molecular sieve replacement service (1-year warranty)
▲ Custom Solutions:Tailored integration with AMHS/MMC systems
and Gas recovery system design
Contact Our Semiconductor Gas Experts
📞 + 8615336587300
📧 sales@newtekgas.com
🌐 www.newtekgas.com
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